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Characteristics of diamond-like carbon films formed by a hybrid laser-plasma ablation of graphite
Method for selective etching of anitreflective coatings
Kinetics of UV/O2 Cleaning and Surface Passivation: Experiments and Modeling
Reduced-Pressure UV Photo-Oxidation of Organic Contaminants on Si Surfaces
Cu Deposition from HF Solutions and Effects on Regrowth of Si Native Oxide
Semiconductor Processing Methods Utilizing Low Concentrations of Reactive Etching Componente
Infrared Spectroscopy of Sub-Surface Defects induced by Remote Hydrogen Plasma exposure of Silicon(100)
Gas-Phase Chemical Cleaning of Silicon Surfaces.
Surface Cleaning Prior to Formation of Si/SiO2 Interfaces by Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD)
Mitigating Communication Delays in Remotely Connected Hardware-in-the-loop Experiments
